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High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film

R1,542,699

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High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film

The High Vacuum Magnetron Sputtering Deposition System is an advanced tool designed for creating high-quality electrode films. This system uses a special process called sputtering, where energetic ions hit a target and release atoms that form a thin film on a substrate. With a quartz thickness monitor, you can easily control the thickness of the film being deposited. This machine is perfect for research and industrial applications requiring precise coatings.

Specifications

AttributeDetails
Sample Stage SizeDiameter 150mm
Heating TemperatureMax 500ºC
Temperature Accuracy±1ºC
Rotational Speed1-20rpm adjustable
Magnetron Sputtering Head2"×3 (1", 2" optional)
Cooling ModeWater cooling
Vacuum Chamber SizeDiameter 500mm × 500mm
Ultimate Vacuum1.0E-5Pa
Total WeightAbout 350kg

Key Features

  • Cost-effective triple target magnetron sputtering coater.
  • Customizable with various target sizes (1-inch, 2-inch, 3-inch).
  • 500W DC and 500W RF power options for different materials.
  • High-precision mass flowmeters for accurate gas control.
  • Turbo-molecular pump for achieving high vacuum levels.
  • Integrated industrial computer for easy control.

Applications

  • Research and development of thin films.
  • Production of electrode films for batteries and capacitors.
  • Coating of substrates in the semiconductor industry.
  • Creation of optical films for various applications.
  • Fabrication of protective coatings on electronic devices.

Product Info Gallery

High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
High Vacuum Magnetron Sputtering Deposition System with Quartz Thickness Monitor for Electrode Film
  • Shipping Timeframes: All orders are processed within 2-5 business days (excluding weekends and holidays). After your order has been processed, the estimated delivery time is before 16 Jun, 2025, depending on customs, Please note that due to high demand, some items may experience longer shipping times, which will be communicated at order confirmation email.
  • Order Processing Time: Please allow 2-5 business days for us to process your order before it is shipped . Orders placed after 16:00 on Fridays, or during weekends and public holidays, will begin processing on the next business day. Processing times may be extended during peak seasons or sales events.
  • Manufacturing Time: Some products needs manufacturing time, the manufacturing process will take approximately 10-30 business days depending on the product. This timeframe may vary depending on the complexity of the product and current demand. but this will be communicated with you during order confirmation.
  • Returns and Exchanges: We offer a 30-day return policy for most items. If you are not completely satisfied with your purchase, you may return it within 30 days of receipt for a refund or exchange. Items must be unused, in their original packaging, and accompanied by proof of purchase. Return shipping costs are the responsibility of the customer, unless the item was damaged or defective upon arrival.

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