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The High Vacuum Magnetron Sputtering Deposition System is an advanced tool designed for creating high-quality electrode films. This system uses a special process called sputtering, where energetic ions hit a target and release atoms that form a thin film on a substrate....
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The High Vacuum Magnetron Sputtering Deposition System is an advanced tool designed for creating high-quality electrode films. This system uses a special process called sputtering, where energetic ions hit a target and release atoms that form a thin film on a substrate. With a quartz thickness monitor, you can easily control the thickness of the film being deposited. This machine is perfect for research and industrial applications requiring precise coatings.
| Attribute | Details |
|---|---|
| Sample Stage Size | Diameter 150mm |
| Heating Temperature | Max 500ºC |
| Temperature Accuracy | ±1ºC |
| Rotational Speed | 1-20rpm adjustable |
| Magnetron Sputtering Head | 2"×3 (1", 2" optional) |
| Cooling Mode | Water cooling |
| Vacuum Chamber Size | Diameter 500mm × 500mm |
| Ultimate Vacuum | 1.0E-5Pa |
| Total Weight | About 350kg |
No approved technical specifications are available yet. Please refer to the product description or contact our team.
The main function of this system is to create high-quality electrode films using a sputtering process, where energetic ions release atoms from a target material that then form a thin film on a substrate.
The system can deposit a variety of materials, including metals, insulators, and semiconductors, thanks to its 500W DC and 500W RF power options.
The quartz thickness monitor measures the frequency change of a quartz crystal as material is deposited on it, allowing precise control over the thickness of the film being deposited.
The maximum heating temperature of the sample stage is 500ºC, with a temperature accuracy of ±1ºC.
The vacuum chamber has a diameter of 500mm and a height of 500mm.
The system can achieve an ultimate vacuum level of 1.0E-5Pa.
Yes, the rotational speed of the sample stage can be adjusted between 1 to 20 rpm.
Yes, the system is customizable with various target sizes, including 1-inch, 2-inch, and 3-inch options.
The system uses water cooling to maintain optimal operating temperatures during the sputtering process.
The total weight of the system is approximately 350kg.
This system is ideal for research and development, battery and capacitor production, semiconductor coating, optical film creation, and protective coating fabrication for electronic devices.
The system is equipped with high-precision mass flowmeters that ensure accurate gas control during the sputtering process.
Yes, the system comes with an integrated industrial computer that allows for easy control and monitoring of the sputtering process.
The system features a triple target magnetron sputtering coater, which allows for versatile material deposition while minimizing costs associated with multiple systems.
Suitable applications include the production of thin films, electrode films for batteries, substrate coatings in the semiconductor industry, optical film creation, and protective coatings for electronics.
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