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The Compact Plasma Etching Cleaner is specially designed for preparing optical glass wafer surfaces in laboratory settings. This machine effectively cleans and etches surfaces, ensuring high-quality results for various applications. With its advanced features and reliab...
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The Compact Plasma Etching Cleaner is specially designed for preparing optical glass wafer surfaces in laboratory settings. This machine effectively cleans and etches surfaces, ensuring high-quality results for various applications. With its advanced features and reliable performance, it is an essential tool for professionals in the field.
| Attribute | Details |
|---|---|
| Chamber Size | Diameter 100 mm; Length 270 mm |
| Harmonic Component | ≤-50 dBc |
| Machine Efficiency | ≥75% |
| Power Stability | ±0.1% |
| RF Connector | N type connector |
| Reflected Power | ≤200W |
| Signal Frequency | 13.56MHz ±0.005% |
| Cooling Method | Forced air cooling |
| Warranty | 1 Year |
| Chamber Size | Diameter 100 mm; Length 270 mm |
|---|---|
| Harmonic Component | ≤-50 dBc |
| Machine Efficiency | ≥75% |
| Power Stability | ±0.1% |
| RF Connector | N type connector |
| Reflected Power | ≤200W |
| Signal Frequency | 13.56MHz ±0.005% |
| Cooling Method | Forced air cooling |
| Warranty | 1 Year |
The Compact Plasma Etching Cleaner is designed to clean and etch optical glass wafer surfaces in laboratory settings, ensuring high-quality results for various applications.
The chamber size of the Compact Plasma Etching Cleaner has a diameter of 100 mm and a length of 270 mm.
The machine has a cleaning efficiency of 75% or higher, making it highly effective for surface preparation.
The Compact Plasma Etching Cleaner comes with a 1-year warranty.
The machine utilizes a forced air cooling system for optimal performance during operation.
Yes, customizable options are available to meet specific requirements for different applications.
Applications include preparing optical glass wafers for microscopy, cleaning surfaces in semiconductor manufacturing, and etching metal surfaces on printed circuit boards (PCBs).
The signal frequency is 13.56 MHz ±0.005%.
Yes, the Compact Plasma Etching Cleaner is specifically designed for use in research laboratories for surface treatment.
The Compact Plasma Etching Cleaner offers power stability of ±0.1%.
The machine is equipped with an N type RF connector.
The maximum reflected power is ≤200W.
Yes, the compact design allows for easy integration in various laboratory environments.
By effectively cleaning and preparing surfaces, the machine enhances adhesion, which is critical in coating applications.
The harmonic component of the machine is ≤-50 dBc, indicating low noise levels during operation.
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