The primary application of the PVD Device is for thin film processing and manufacturing, particularly in electronics applications.
The system can operate at temperatures ranging from room temperature (RT) to 800°C, with an optional range up to 1200°C.
The device features a retractable thickness monitor that provides high precision in measuring the film thickness during the deposition process.
The vacuum system includes a mechanical pump, molecular pump, adsorption pump, and a cold trap, ensuring superior performance with an ultimate vacuum better than 1*10^-10 mbar.
The load chamber can accommodate up to 6 pieces of 2-inch wafers.
Yes, the PVD Device features a fully automatic operation control system using PC and PLC, along with safety interlocks for ease of use.
The weight of the PVD Device is approximately 200 kg.
The device operates on a power supply of 1000W at a voltage of 220V.
The PVD Device comes with a 1-year warranty.
Yes, the system is suitable for semiconductor fabrication as well as various other applications in thin film research and development.
Yes, the system includes 6-10 in-situ monitoring evaporation sources, providing versatility for different applications.
Key features include fully automatic operation, high precision in film thickness measurement, a robust vacuum system, multiple evaporation sources, and customizable dimensions.
The system can be used for optical coatings, coating and surface treatment processes, and manufacturing electronic components.
While the device is designed for easy use, specific training may be available depending on the supplier; it is advisable to check with them for details.
Yes, the dimensions of the system can be customized to fit your specific requirements.
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