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Clean Semiconductor Wafer After Etching ICP Experimental Plasma Removing Photoresist Machine

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  • Shipping Timeframes: All orders are processed within 2-5 business days (excluding weekends and holidays). After your order has been processed, the estimated delivery time is before 04 Feb, 2026, depending on customs, Please note that due to high demand, some items may experience longer shipping times, which will be communicated at order confirmation email.
  • Order Processing Time: Please allow 2-5 business days for us to process your order before it is shipped . Orders placed after 16:00 on Fridays, or during weekends and public holidays, will begin processing on the next business day. Processing times may be extended during peak seasons or sales events.
  • Manufacturing Time: Some products needs manufacturing time, the manufacturing process will take approximately 10-30 business days depending on the product. This timeframe may vary depending on the complexity of the product and current demand. but this will be communicated with you during order confirmation.
  • Returns and Exchanges: We offer a 30-day return policy for most items. If you are not completely satisfied with your purchase, you may return it within 30 days of receipt for a refund or exchange. Items must be unused, in their original packaging, and accompanied by proof of purchase. Return shipping costs are the responsibility of the customer, unless the item was damaged or defective upon arrival.
1. What is the primary function of the Clean Semiconductor Wafer After Etching ICP Experimental Plasma Removing Photoresist Machine?

The primary function of this machine is to efficiently and effectively remove photoresist from semiconductor wafers using advanced plasma technology.

2. What are the dimensions and weight of the machine?

The machine has a single package size of 120x110x160 cm and weighs 350 kg.

3. What is the warranty period for this machine?

The machine comes with a warranty period of 1 year.

4. Is there any testing report available for this machine?

Yes, a machinery test report is provided with the purchase of the machine.

5. What are the key features of this cleaning machine?

Key features include advanced plasma technology for quick photoresist removal, a user-friendly interface, robust construction for durability, high efficiency in cleaning, and suitability for various semiconductor applications.

6. Can this machine be used in research labs?

Yes, it is ideal for cleaning semiconductor wafers in research labs and preparing them for further processing.

7. How does this machine enhance productivity in semiconductor production lines?

The high efficiency of this machine saves time in the wafer cleaning process, allowing for faster turnaround and increased productivity in production lines.

8. What brand manufactures this machine?

This machine is manufactured by minder-hightech.

9. Is training provided for operating the machine?

While specific training details are not mentioned, the user-friendly interface is designed for easy operation, making it accessible for users with basic training.

10. What applications is this machine suitable for?

The machine is suitable for cleaning semiconductor wafers in research labs, preparing wafers for manufacturing, quality control, testing environments, and supporting experimental setups.

11. What is the price range for the machine?

The price for the Clean Semiconductor Wafer After Etching ICP Experimental Plasma Removing Photoresist Machine starts at US$ 370,000.

12. Does the machine come with videos of outgoing inspections?

Yes, a video of the outgoing inspection is provided with the machine.

13. What type of core components does this machine feature?

The core component of this machine is a PLC (Programmable Logic Controller), which ensures precise control over the cleaning process.

14. Is this machine suitable for small-scale operations?

While designed for high-quality semiconductor processing, it can be utilized in small-scale operations, especially in research and experimental setups.

15. How does the advanced plasma technology work in this machine?

The advanced plasma technology generates plasma that effectively breaks down and removes the photoresist from semiconductor surfaces, ensuring thorough cleaning.

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