The primary function of this machine is to efficiently and effectively remove photoresist from semiconductor wafers using advanced plasma technology.
The machine has a single package size of 120x110x160 cm and weighs 350 kg.
The machine comes with a warranty period of 1 year.
Yes, a machinery test report is provided with the purchase of the machine.
Key features include advanced plasma technology for quick photoresist removal, a user-friendly interface, robust construction for durability, high efficiency in cleaning, and suitability for various semiconductor applications.
Yes, it is ideal for cleaning semiconductor wafers in research labs and preparing them for further processing.
The high efficiency of this machine saves time in the wafer cleaning process, allowing for faster turnaround and increased productivity in production lines.
This machine is manufactured by minder-hightech.
While specific training details are not mentioned, the user-friendly interface is designed for easy operation, making it accessible for users with basic training.
The machine is suitable for cleaning semiconductor wafers in research labs, preparing wafers for manufacturing, quality control, testing environments, and supporting experimental setups.
The price for the Clean Semiconductor Wafer After Etching ICP Experimental Plasma Removing Photoresist Machine starts at US$ 370,000.
Yes, a video of the outgoing inspection is provided with the machine.
The core component of this machine is a PLC (Programmable Logic Controller), which ensures precise control over the cleaning process.
While designed for high-quality semiconductor processing, it can be utilized in small-scale operations, especially in research and experimental setups.
The advanced plasma technology generates plasma that effectively breaks down and removes the photoresist from semiconductor surfaces, ensuring thorough cleaning.
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