PECVD is a process used to deposit thin films of material onto a substrate using plasma and chemical vapor. It allows for the creation of high-quality hydrophobic films with excellent water resistance.
The key features include automatic matching for easy operation, high reflection power for efficient film deposition, customized tube size, a robust air cooling system, and stable RF frequency for consistent results.
The PECVD system can be used for creating hydrophobic surfaces in electronics, enhancing water resistance in textiles, improving protective coatings, developing anti-fogging films for optical devices, and facilitating research in advanced materials science.
The maximum reflection power of the PECVD system is 200W.
The PECVD system weighs 340 kg.
The RF frequency stability is 13.56 MHz ±0.005%, ensuring consistent performance during film deposition.
The PECVD system utilizes an air cooling system, which provides optimal performance during operation.
Yes, the PECVD system allows for customized tube sizes to fit specific needs and can support OEM customization.
The PECVD system comes with a warranty period of 3 years.
Yes, the PECVD system is suitable for research in advanced materials science, among other applications.
The automatic matching feature simplifies operation by automatically adjusting parameters for optimal film deposition, reducing the need for manual adjustments.
The system is designed to create various types of hydrophobic films suitable for electronics, textiles, and protective coatings, among other applications.
Hydrophobic films are important for enhancing water resistance in products, protecting surfaces from moisture damage, and improving the durability and performance of various materials.
Typically, training and support are provided during the installation process to ensure users can operate the PECVD system effectively.
More information and support for the PECVD system can usually be found on the manufacturer's website or through their customer service channels.
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