The model number of the Photolithography Machine is ME-2000/34AL.
The maximum exposure area is 160mm x 160mm.
The exposure energy density is greater than 35mW/cm² and is adjustable.
The exposure resolution can be adjusted between 0.8um to 1um.
The exposure wavelength is 365nm.
The light life is approximately 20,000 hours.
The machine weighs 300 KG.
The registration accuracy is ±0.8-1 um.
The machine supports mask sizes of 3'' x 3'', 4'' x 4'', 5'' x 5'', and 7'' x 7''.
It is ideal for wafer production in semiconductor manufacturing, educational purposes, research and development projects, prototyping in various engineering fields, and precision work in the electronics industry.
Yes, the machine comes with a 1-year warranty.
Absolutely! It is designed for both industry professionals and students, making it perfect for school teaching.
Key features include high exposure energy density, adjustable exposure resolution, long light life, support for various mask sizes, and a compact design.
Yes, it is very useful for research and development projects in various fields.
The illumination non-uniformity is ≤2.5% over a 150mm range, ensuring high precision and consistent results.
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