The machine is designed to effectively clean optical glass and ceramic materials, making it ideal for laboratories and research settings.
The Lab 2L Plasma Cleaning Machine offers two power options: 500W and 1000W, allowing you to choose the best setting for your cleaning needs.
The machine features a forced air cooling system that ensures safe operation and prevents overheating during the cleaning process.
Yes, the machine offers both manual control and programmable control options, allowing for automation of the cleaning process.
The vacuum degree of the Lab 2L Plasma Cleaning Machine ranges from 60Pa to 100Pa, ensuring optimal cleaning conditions.
The Lab 2L Optical Glass Wafer Vacuum Plasma Etching Cleaner comes with a 3-year warranty, providing peace of mind for your investment.
The cleaning chamber has a capacity of 10L, allowing for ample space to accommodate various materials.
Yes, this plasma cleaning machine is ideal for research and development in material science, particularly for enhancing the surface quality of materials.
The machine is constructed with a durable quartz tube material, ensuring long-lasting performance and reliability.
The dimensions of the Lab 2L Plasma Cleaning Machine are 200mm, making it compact for laboratory use.
Yes, the machine is suitable for preparing ceramics for further processing, making it versatile for various applications.
You can adjust the cleaning settings using either the manual control or the programmable control options based on your cleaning requirements.
Yes, a user manual is provided with the machine to guide you through its setup, operation, and maintenance.
Regular maintenance includes checking the vacuum system, cleaning the quartz tube, and ensuring the cooling system is functioning properly.
You can purchase the machine through authorized distributors or directly from the manufacturer's website.
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