HFCVD is a process used to create diamond and nanodiamond films on various substrates through chemical vapor deposition, utilizing hot wire technology to enhance the deposition of high-quality diamond layers.
The HFCVD Diamond Coating Equipment is suitable for industries such as materials science, electronics, and mechanical engineering, where high-quality diamond coatings are required.
The equipment can handle a wide range of substrates, making it versatile for various materials used in advanced coating applications.
The hot wire can reach temperatures up to 2500°C, allowing for precise control over the deposition process.
The equipment operates on AC220V or Three-phase 380V, with a power requirement of 30KW.
The system features a semi-automatic control interface that includes a PLC and touch screen for easy monitoring and adjustment of parameters.
The deposition cavity measures OD640x320mm, allowing for the accommodation of various substrate sizes.
The substrate surface can reach about 600°C during the deposition process, ensuring a stable environment for optimal coating results.
The equipment comes with a 1-year warranty, ensuring quality and performance assurance.
The dimensions of the HFCVD system are 1800(L) x 1500(W) x 1550(H) mm, making it compact yet capable of handling large substrates.
Built with a stainless steel substrate, the equipment is designed for long-lasting durability and resistance to wear and tear, ensuring reliable performance in demanding environments.
Yes, the HFCVD system is designed for efficiency and can produce high-quality diamond coatings rapidly, enhancing productivity.
The HFCVD system offers advanced temperature control, a semi-automatic interface, and a robust design, making it a state-of-the-art solution for diamond coating.
Yes, the HFCVD equipment is versatile enough to handle both nanodiamonds and larger diamond coatings, meeting various industry requirements.
The compact design of the HFCVD equipment allows for efficient use of space in laboratories or industrial settings, while still providing effective deposition capabilities.
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